SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Inspection and printability of programmed defects on reticles for 0.200- and 0.175-μm rule devices
Yamaguchi, Shinji, Kanai, Hideki, Komano, Haruki, Sakurai, Hideaki, Kondo, Takehiro, Itoh, Masamitsu, Mori, Ichiro, Higashikawa, Iwao, Morimoto, HiroakiVolume:
3748
Year:
1999
Language:
english
DOI:
10.1117/12.360229
File:
PDF, 914 KB
english, 1999