SPIE Proceedings [SPIE LAMP 2002: International Congress on Laser Advanced Materials Processing - Osaka, Japan (Monday 27 May 2002)] Third International Symposium on Laser Precision Microfabrication - Laser-induced shock wave removal of chemical-mechanical polishing slurries from silicon wafers
Lee, J. M., Cho, S. H., Park, J. G., Lee, S. H., Han, Y. P., Kim, S. Y., Miyamoto, Isamu, Kobayashi, Kojiro F., Sugioka, Koji, Poprawe, Reinhart, Helvajian, HenryVolume:
4830
Year:
2003
Language:
english
DOI:
10.1117/12.486511
File:
PDF, 340 KB
english, 2003