SPIE Proceedings [SPIE 11th Annual BACUS Symposium on Photomask Technology - Sunnyvale, United States (Wednesday 25 September 1991)] 11th Annual BACUS Symposium on Photomask Technology - Printability of pellicle defects in DUV 0.5-um lithography
Yan, Pei-yang, Yeung, Michael S., Gaw, Henry T., McGinnis, Kevin C.Volume:
1604
Year:
1992
Language:
english
DOI:
10.1117/12.56939
File:
PDF, 430 KB
english, 1992