SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Determination of mask induced polarization effects on AltPSM mask structures
Hollein, Ingo, Komuro, Masanori, Teuber, Silvio, Bubke, KarstenVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617432
File:
PDF, 66 KB
english, 2005