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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Effect of grating pitch variation on scatterometry measurements
Forman, Darren, Archie, Chas N., Littau, Mike, Raymond, Christopher J., Hummel, Steven G.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656615
File:
PDF, 382 KB
english, 2006