SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Tolerancing analysis of customized illumination for practical applications of source and mask optimization
Matsuyama, Tomoyuki, Dusa, Mircea V., Conley, Will, Kita, Naonori, Nakashima, Toshiharu, Tanitsu, Osamu, Owa, SoichiVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846639
File:
PDF, 1.30 MB
english, 2010