SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - A non-delta-chrome OPC methodology for process models with three-dimensional mask effects
Ng, Philip C. W., Dusa, Mircea V., Conley, Will, Tsai, Kuen-Yu, Tang, Chih-Hsien, Melvin, LawrenceVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846687
File:
PDF, 425 KB
english, 2010