A Titanium-Doped SiO x...

Angewandte Chemie International Edition 2016 / 06

A Titanium-Doped SiO x Passivation Layer for Greatly Enhanced Performance of a Hematite-Based Photoelectrochemical System

Ahn, Hyo-Jin, Yoon, Ki-Yong, Kwak, Myung-Jun, Jang, Ji-Hyun
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Language:
english
Journal:
Angewandte Chemie International Edition
DOI:
10.1002/anie.201603666
Date:
June, 2016
File:
PDF, 2.60 MB
english, 2016
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