SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Inspection of high-aspect ratio layers at sub 20nm node
Vikram, Abhishek, Lin, Kuan, Camp, Janay, Kini, Sumanth, Jin, Frank, Venkatesan, Vinod, Starikov, Alexander, Cain, Jason P.Volume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2011574
File:
PDF, 281 KB
english, 2013