SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Optimal temperature profiles for postexposure bake of photoresist
Hansson, Anders, Boyd, Stephen P., Singh, BhanwarVolume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308736
File:
PDF, 2.31 MB
english, 1998