SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Differences between wafer and bake plate temperature uniformity in proximity bake: a theoretical and experimental study
Ramanan, Natarajan, Kozman, Austin, Sims, James B., Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388375
File:
PDF, 259 KB
english, 2000