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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Depth-of-focus enhancement of isolated lines by multiple-focus exposure with negative-tone resist process
Fujimoto, Masashi, Yamazaki, Tamio, Hashimoto, Takeo, Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.388946
File:
PDF, 262 KB
english, 2000