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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - 130-nm KrF lithography for DRAM production with 0.68-NA scanner
Kawamura, Eiichi, Nagai, Kouichi, Kanemitsu, Hideyuki, Tabata, Yasuko, Inoue, Soichi, Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.389088
File:
PDF, 1.23 MB
english, 2000