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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability
Chen, Jerry X., Howard, Charles H., Son, Kong, Kalk, Franklin D., Lee, Il-Ho, Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392032
File:
PDF, 4.07 MB
english, 2000