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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Characterization of the polymer-developer interface in 193-nm photoresist polymers and formulations during dissolution
Wallow, Thomas I., Chan, Wendy, Hinsberg, William D., Lee, Seok-Won, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474228
File:
PDF, 721 KB
english, 2002