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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Enhanced processing: sub-50 nm features with 0.8-μm DOF using a binary reticle
Van Steenwinckel, David, Lammers, Jeroen, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485202
File:
PDF, 844 KB
english, 2003