SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Short-term vacuum outgassing measurements with application to load-locks and photoresist
Keen, Anthony M., Mackay, R. Scott, Condon, NeilVolume:
5374
Year:
2004
Language:
english
DOI:
10.1117/12.557209
File:
PDF, 339 KB
english, 2004