SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror
Kakutani, Yukinobu, Lercel, Michael J., Niibe, Masahito, Gomei, Yoshio, Takase, Hiromitsu, Terashima, Shigeru, Matsunari, Shuichi, Aoki, Takashi, Murakami, Katsuhiko, Fukuda, YasuakiVolume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.656240
File:
PDF, 245 KB
english, 2006