SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Defectivity reduction studies for ArF immersion lithography
Matsunaga, Kentaro, Lin, Qinghuang, Kondoh, Takehiro, Kato, Hirokazu, Kobayashi, Yuuji, Hayasaki, Kei, Ito, Shinichi, Yoshida, Akira, Shimura, Satoru, Kawasaki, Tetsu, Kyoda, HideharuVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711331
File:
PDF, 370 KB
english, 2007