SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Size tolerance of sub-resolution assist features for sub-50-nm node device
Kim, Byung-Sung, Flagello, Donis G., Lee, Sung-Ho, Shin, Hong-Jae, Lee, Nae-InVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.711922
File:
PDF, 218 KB
english, 2007