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SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - DFM based on layout restriction and process window verification for sub-60nm memory devices
Choi, Soo-Han, Watanabe, Hidehiro, Jung, Dai-Hyun, Hong, Ji-Suk, Choi, Joon-Ho, Yoo, Moon-Hyun, Kong, Jeong-TaekVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728958
File:
PDF, 716 KB
english, 2007