SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - 90nm node contact hole patterning through applying model based OPC in KrF lithography
Jeon, Young-Doo, Lee, Sang-Uk, Choi, Jaeyoung, Kim, Jeahee, Han, JaewonVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.773075
File:
PDF, 508 KB
english, 2008