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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Physical matching of CD-SEM: noise analysis and verification in FAB environment
Kramer, Uwe, Allgair, John A., Raymond, Christopher J., Navarra, Alessandra, Fleischer, Goeran, Kaiser, Jan, Voss, Frank, Zuckerman, Galit, Kris, Roman, Ben-Dayan, Igal, Sommer, Elad, Len, Amir, Dror,Volume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.776865
File:
PDF, 448 KB
english, 2008