SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Adhesion control between resist patterns and photomask blank surfaces
Kurihara, Masaaki, Hosono, Kunihiro, Hatakeyama, Sho, Yoshida, Kouji, Nagai, Takaharu, Totsukawa, Daisuke, Fukuda, Masaharu, Morikawa, Yasutaka, Mohri, Hiroshi, Hoga, Morihisa, Hayashi, Naoya, Ohtani,Volume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824251
File:
PDF, 499 KB
english, 2009