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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Engine for characterization of defects, overlay, and critical dimension control for double exposure processes for advanced logic nodes
Holmes, Steven, Henderson, Clifford L., Koay, Chiew-Seng, Petrillo, Karen, Chen, Kuang-Jung, Colburn, Matthew E., Cantone, Jason, Ueda, Kenichi, Metz, Andrew, Dunn, Shannon, van Dommelen, Youri, CrousVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.828483
File:
PDF, 583 KB
english, 2009