SPIE Proceedings [SPIE 26th European Mask and Lithography Conference - Grenoble, France (Monday 18 January 2010)] 26th European Mask and Lithography Conference - Mask phase and transmission variation effects on wafer critical dimensions for nodes 65nm and 45nm
Dufaye, F., Behringer, Uwe F.W., Maurer, Wilhelm, Gough, S., Sundermann, F., Farys, V., Miyashita, H., Sartelli, L., Perissinotti, F., Buttgereit, U., Perlitz, S., Birkner, R.Volume:
7545
Year:
2010
Language:
english
DOI:
10.1117/12.863147
File:
PDF, 700 KB
english, 2010