SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Study of EUV mask defect repair using FIB method
Amano, Tsuyoshi, Montgomery, M. Warren, Maurer, Wilhelm, Takagi, Noriaki, Shigemura, Hiroyuki, Terasawa, Tsuneo, Suga, Osamu, Shiina, Kensuke, Aramaki, Fumio, Yasaka, Anto, Inazuki, Yuichi, Hayashi, NVolume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.864213
File:
PDF, 1.73 MB
english, 2010