SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Extraction and utilization of the repeating patterns for CP writing in mask making
Shoji, Masahiro, Hosono, Kunihiro, Inoue, Tadao, Yamabe, MasakiVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.864285
File:
PDF, 1.36 MB
english, 2010