SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - eMET: development of a 50 keV electron projection multibeam mask exposure tool for the 16nm hp technology node and below
Platzgummer, Elmar, Hosono, Kunihiro, Cernusca, Stefan, Klein, Christof, Kvasnica, Samuel, Sonalkar, Bernd, Loeschner, HansVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.866350
File:
PDF, 1.57 MB
english, 2010