SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Correcting image placement errors using registration control (RegC) technology
Graitzer, Erez, Antesberger, Gunter, Ben-Zvi, Guy, Cohen, Avi, Dmitriev, Vladimir, Winkelmeier, StephanieVolume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.879885
File:
PDF, 1.25 MB
english, 2011