SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - 22X mask cleaning effects on EUV lithography process and lifetime
George, Simi A., La Fontaine, Bruno M., Naulleau, Patrick P., Chen, Robert J., Baclea-an, Lorie-Mae, Naulleau, Patrick P.Volume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.881525
File:
PDF, 1016 KB
english, 2011