SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Challenges of SEM-based critical dimension metrology of interconnect
Raymond, Christopher J., Ukraintsev, Vladimir A., Jessen, Scott, Mikeska, Brian, Sallee, Chris, Khvatkov, VitaliVolume:
7971
Year:
2011
Language:
english
DOI:
10.1117/12.882183
File:
PDF, 11.80 MB
english, 2011