SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Resist process optimization for further defect reduction
Tanaka, Keiichi, Iseki, Tomohiro, Marumoto, Hiroshi, Takayanagi, Koji, Yoshida, Yuichi, Uemura, Ryouichi, Yoshihara, Kosuke, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.915813
File:
PDF, 3.09 MB
english, 2012