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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Evaluating Process Optimums for Production VLSI Lithography
Brown, Erik S., Nelson, William C., Howland, Gene, Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953068
File:
PDF, 361 KB
english, 1989