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SPIE Proceedings [SPIE SPIE's International Symposium on Optical Science, Engineering, and Instrumentation - Denver, CO (Sunday 18 July 1999)] EUV, X-Ray, and Neutron Optics and Sources - High-power x-ray point source for next-generation lithography
Turcu, I. C. Edmond, Forber, Richard A., Grygier, Robert K., Rieger, Harry, Powers, Michael F., Campeau, S. M., French, G., Foster, Richard M., Mitchell, Phillip V., Gaeta, Celestino J., Cheng, Z., BuVolume:
3767
Year:
1999
Language:
english
DOI:
10.1117/12.371118
File:
PDF, 3.09 MB
english, 1999