SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Practical optical-proximity-correction approach by considering interlayer overlap
Choi, Byoung-Il, Khoh, Andrew, Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.389022
File:
PDF, 876 KB
english, 2000