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SPIE Proceedings [SPIE Micromachining and Microfabrication - San Jose, CA (Saturday 25 January 2003)] Micromachining and Microfabrication Process Technology VIII - Design rules for the fabrication of binary half-tone masks used for MEMS and photonic devices
Rhyins, Peter D., Progler, Christopher J., Claydon, Glenn S., Balch, Ernest W., Yasaitis, John A., Perez-Maher, Mary Ann, Karam, Jean MichelVolume:
4979
Year:
2003
Language:
english
DOI:
10.1117/12.478283
File:
PDF, 351 KB
english, 2003