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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Fracture friendly optical proximity correction
Amoroso, Frank, Weed, J. Tracy, Martin, Patrick M., Cote, Michel, Do, Tanya, Lugg, Robert, Nogatch, JohnVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632220
File:
PDF, 174 KB
english, 2005