SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - CD-bias reduction in CD-SEM line-width measurement for the 32-nm node and beyond using the model-based library method
Shishido, Chie, Allgair, John A., Raymond, Christopher J., Tanaka, Maki, Osaki, MayukaVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.813948
File:
PDF, 643 KB
english, 2009