![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II - Production of x-ray mask blanks for a point source stepper
Trimble, Lee E., Celler, George K., Frackoviak, John, Liddle, James A., Weber, Gary R., Peckerar, Martin C.Volume:
1671
Year:
1992
Language:
english
DOI:
10.1117/12.136016
File:
PDF, 370 KB
english, 1992