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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Design of PACs for high-performance photoresists (II): effect of number and orientation of DNQs and -OH of PACs on lithographic performances
Hanawa, Ryotaro, Uetani, Yasunori, Hanabata, Makoto, Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154756
File:
PDF, 339 KB
english, 1993