SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Integrated Circuit Metrology, Inspection, and Process Control VIII - 0.35-micron DUV lithography for poly gate layer
Farrar, Nigel R., Singh, Bhanwar, Bennett, Marylyn H.Volume:
2196
Year:
1994
Language:
english
DOI:
10.1117/12.174135
File:
PDF, 513 KB
english, 1994