SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Performance-based metrology of critical device performance parameters for in-line non-contact high-density intra-die monitor/control on a 32nm SOI advanced logic product platform
Pelella, Mario M., Mocuta, Anda C., Lee, Birk, Zamdmer, Noah, Slisher, Dustin K., Yu, Xiaojun, Vickers, James S., Tsuruta, Yota, Iyer, Subramanian S., Pakdaman, Nader, Starikov, Alexander, Cain, JasonVolume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2025869
File:
PDF, 774 KB
english, 2013