SPIE Proceedings [SPIE SPIE Photomask Technology -...

  • Main
  • SPIE Proceedings [SPIE SPIE Photomask...

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Measurement of EUV absorber and resist CD using spectroscopic ellipsometer

Lee, Kyung M., Tavassoli, Malahat, Yan, Pei-yang, Zhang, Guojing, Faure, Thomas B., Ackmann, Paul W.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2027231
File:
PDF, 282 KB
english, 2013
Conversion to is in progress
Conversion to is failed