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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advanced Etch Technology for Nanopatterning III - 28nm FDSOI high-K metal gate CD variability investigation
Oehrlein, Gottlieb S., Lin, Qinghuang, Zhang, Ying, Desvoivres, L., Gouraud, P., Le Gratiet, B., Bouyssou, R., Ranica, R., Gallon, C., Thomas, I.Volume:
9054
Year:
2014
Language:
english
DOI:
10.1117/12.2045904
File:
PDF, 623 KB
english, 2014