SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Progress on accurate metrology of pitch, height, roughness, and width artifacts using an atomic force microscope
Schneir, Jason, McWaid, Thomas H., Dixson, Ronald G., Tsai, Vincent W., Villarrubia, John S., Williams, Ellen D., Fu, E., Bennett, Marylyn H.Volume:
2439
Year:
1995
Language:
english
DOI:
10.1117/12.209224
File:
PDF, 725 KB
english, 1995