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SPIE Proceedings [SPIE SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation - San Diego, CA (Sunday 9 July 1995)] Applications of Laser Plasma Radiation II - Developments of a high-power, low-contamination laser-plasma source for EUV projection lithography
Shmaenok, Leonid A., Bijkerk, Fred, Bruineman, C., Bastiaensen, R. K. F., Shevelko, Alexander P., Simanovski, Dmitrii M., Gladskikh, A. N., Bobashev, Sergei V., Richardson, Martin C., Kyrala, George AVolume:
2523
Year:
1995
Language:
english
DOI:
10.1117/12.220971
File:
PDF, 791 KB
english, 1995