SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - OPC for curved designs in application to photonics on silicon
Erdmann, Andreas, Kye, Jongwook, Orlando, Bastien, Farys, Vincent, Schneider, Loïc, Cremer, Sébastien, Postnikov, Sergei V., Millequant, Matthieu, Dirrenberger, Mathieu, Tiphine, Charles, Bayle, SébasVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2230400
File:
PDF, 1.93 MB
english, 2016