SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Proximity effect correction for reticle fabrication
Kamikubo, Takashi, Abe, Takayuki, Oogi, Susumu, Anze, Hirohito, Shimizu, Mitsuko, Itoh, Masamitsu, Nakasugi, Tetsuro, Iijima, Tomohiro, Hattori, Yoshiaki, Aizaki, NaoakiVolume:
3096
Year:
1997
Language:
english
DOI:
10.1117/12.277291
File:
PDF, 112 KB
english, 1997