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SPIE Proceedings [SPIE Optical Science, Engineering and Instrumentation '97 - San Diego, CA (Sunday 27 July 1997)] Charged Particle Optics III - Novel resist and exposure strategy for high-resolution electron-beam lithography
Daumann, Walter, Bertenburg, Ralf M., van den Berg, Christophe, Tegude, Franz-Josef, Munro, EricVolume:
3155
Year:
1997
Language:
english
DOI:
10.1117/12.279393
File:
PDF, 653 KB
english, 1997